Modification of Surfaces Using Polymers Towards Preparation of Functional Coatings

2024-12-6
Terzioğlu, İpek
In this thesis study, self-polymerization of dopamine (DOP) in the presence of tannic acid (TA) was examined in 0.05 M Tris HCl buffer at pH 8.5 and 25 °C. Single-and multi-layer films of co-deposited polydopamine (PDA) and TA (PDATA) were prepared. The properties of PDATA films such as thickness, wettability, morphology and stability were compared with PDA films. PDA films exhibited higher thickness and rougher surfaces. TA provided control on the size of PDA particles and surface roughness of the films. Drying between each layer deposition and extended polymerization time reduced thickness for both PDA and PDATA films. Additionally, layer-by-layer (LbL) assembly of PDATA and PDA was examined using branched polyethyleneimine (BPEI), TA, and poly(vinyl caprolactam) (PVCL). Electrostatic interactions were mainly responsible for LbL assembly with BPEI. The main driving force for TA and PVCL-based multilayers was hydrogen bonding. PDATA provided higher thickness than PDA based films when co-assembled with BPEI or PVCL. In contrast, it provided lower thickness when LbL deposited with TA. PDA-based multilayers resulted in greater roughness due to formation of larger particles during polymerization. PDATA/TA films provided the roughest multilayer films among PDATA films, while PDATA/PVCL multilayers displayed smoothest surfaces. PVCL-based multilayers showed the lowest wettability, while multilayers with TA exhibited the highest wettability among all films. BPEI-based multilayers provided the highest stability in PBS at pH 7.4/37 °C. PVCL-based multilayers presented greater stability than TA containing films. This thesis presents a comparative study of PDATA and PDA-based multilayers, generating fundamental information for optimization of PDA-based coatings.
Citation Formats
İ. Terzioğlu, “Modification of Surfaces Using Polymers Towards Preparation of Functional Coatings,” M.S. - Master of Science, Middle East Technical University, 2024.