An X-ray photoelectron spectroscopy study on the annealing effects for Al/glass Interface during aluminum induced texturing process

Date

2017-10-31

Author

Ünal, Mustafa
Yıldız, İlker
Turan, Raşit

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The aluminum induced texturing method offers an effective light trapping scheme by random texture that is formed by U-shaped craters on the glass surface. The texture is mainly shaped by the reaction between Al and SiO2. However, the reaction mechanismis not totally understood. Besides, the influence of other components present in the glass such as Na2O, CaO, andMgO. is neglected. In this study, the evolution of Al films on soda-lime glass during annealing has been inspected by depth resolved X-ray photoelectron spectroscopy. The elemental distribution of Si, Al and O have been investigated for different annealing durations and compositional analysis has been conducted for Na, Ca andMg in addition to Si, Al and O. According to results, a relevant evolutionmodel for annealing process has been constructed.

Subject Keywords

Depth profile, X-ray photoelectron spectroscopy, Aluminum, Float glass, Thermal annealing, Aluminum induced texturing

URI

https://hdl.handle.net/11511/38066

Journal

THIN SOLID FILMS

DOI

https://doi.org/10.1016/j.tsf.2017.08.046

Collections

Center for Solar Energy Research and Applications (GÜNAM), Article

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Citation Formats

M. Ünal, İ. Yıldız, and R. Turan, “An X-ray photoelectron spectroscopy study on the annealing effects for Al/glass Interface during aluminum induced texturing process,” THIN SOLID FILMS, pp. 38–44, 2017, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/38066.