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Fluorene-type Thin Films Synthesized under Biphenyl and Ethylene RF Plasma

Mansuroğlu, Doğan
Manolache, Sorin
The mixture of biphenyl (C12H10) and ethylene (C2H4) plasma was used to synthesize fluorene (C13H10) -type films by a 13.56 MHz capacitive coupled RF plasma system. The thin films were deposited on glass slides. Changes of layers were investigated when a negative bias potential was applied to the holder of the substrate. The chemical environment was explored by residual gas analysis (RGA) mass spectrometry. Deposited layers were investigated by UV-visible spectroscopy, Atomic Force Microscope (AFM) and ellipsometry. The thin films were doped with Iodine (I-2) for different time periods.