Plasma Assisted Low TemperatureElectron Beam Deposition of NiO Thin Films for Electro-Optic Applications

Date

2017-11-26

Author

Coşar, Mustafa Burak
İçli, Kerem Çağatay
Özenbaş, Ahmet Macit

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https://hdl.handle.net/11511/74533

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Plasma assisted low temperature electron beam deposited NiO thin films for electro-optic applications Cosar, Mustafa Burak; Icli, Kerem Cagatay; Özenbaş, Ahmet Macit (2018-05-01) This study aims to create high quality nickel oxide (NiO) thin films at low temperatures, which is a prerequisite for coatings on temperature sensitive substrates. NiO chunks were evaporated by electron beam source, and NiO thin films were deposited at a thickness value around 250 nm. Depositions were performed at different experimental conditions: oxygen flow rate, deposition temperature, deposition rate, and plasma assistance. Deposited films were analyzed with regard to the structural, optical, and elect...
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Citation Formats

M. B. Coşar, K. Ç. İçli, and A. M. Özenbaş, “Plasma Assisted Low TemperatureElectron Beam Deposition of NiO Thin Films for Electro-Optic Applications,” 2017, Accessed: 00, 2021. [Online]. Available: https://hdl.handle.net/11511/74533.