Kimyasal buhar depolama yöntemi ile büyütülmüş polikristal silisyum ince filmlerin elektrik özellikleri

Date

1989-11-15

Author

Katırcıoğlu, Bayram
Atılgan, I.

Metadata

Show full item record

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Item Usage Stats

26
views

0
downloads

URI

https://hdl.handle.net/11511/95669

Collections

Department of Physics, Project and Design

Suggestions

OpenMETU
Core

Kimyasal buhar biriktirme yöntemi ile bor karbür üretimi Özbelge, Önder H.; Karaman, Mustafa(2005) Mekanik, ısıl, kimyasal ve elektriksel özellikleri ile bor karbür (B4C) diğer birçok refrakter malzemeden üstün özelliklerde olduğundan endüstride geniş bir uygulama alanı bulmaktadır, gelecekte de yeni kullanım alanları bulacaktır. Bu uygulamaların başlıcaları, nükleer endüstrisinde nötron absorplayıcısı olarak, yüksek çarpma direnci (impact resistance) nedeniyle zırh yapmada ve sürtünme direnci nedeniyle metal kaplamalardadır. Yakın zamanlarda bor karbür yüksek ergime noktası, düşük yoğunluğu ve kimyasall...
Chemical vapor deposition of boron carbide Karaman, Mustafa; Özbelge, Önder; Department of Chemical Engineering (2007) Boron carbide was produced on tungsten substrate in a dual impinging-jet CVD reactor from a gas mixture of BCl3, CH4, and H2. The experimental setup was designed to minimise the effect of mass transfer on reaction kinetics, which, together with the on-line analysis of the reactor effluent by FTIR, allowed a detailed kinetic investigation possible. The phase and morphology studies of the products were made by XPS, XRD,micro hardness and SEM methods. XPS analysis showed the existence of chemical states attrib...
Production of carbon nanotubes by chemical vapor deposition Ayhan, Umut Barış; Gündüz, Güngör; Department of Chemical Engineering (2004) Carbon nanotubes, which is one of the most attractive research subject for scientists, was synthesized by two different methods: Chemical vapor deposition (CVD), a known method for nanotube growth, and electron beam (e-beam), a new method which was used for the first time for the catalytic growth of carbon nanotubes. In both of the methods, iron catalyst coated silica substrates were used for the carbon nanotube growth, that were prepared by the Sol-Gel technique using aqueous solution of Iron (III) nitrate...
Production of boron nitride using chemical vapor deposition method Mercan, Özge; Özbelge, Önder; Sezgi, Naime Aslı; Department of Chemical Engineering (2014) Boron nitride is a promising material with its outstanding characteristics like chemical inertness, large band gap, high oxidation resistance and thermal conductivity. It is also used as ceramic matrix component which transfers external load and deflects matrix cracks. Therefore, it has become a subject matter for many studies. In this study, the process of boron nitride (BN) production from diborane (B2H6) and ammonia (NH3) on tungsten (W) substrate in impinging jet reactor is investigated using chemical v...
Determination of silver by chemical vapour generation and atomic absoption spectrometry Öztürk, Çağla Pınar; Ataman, Osman Yavuz; Department of Chemistry (2004) A method for determination of silver has been developed based on chemical vapour generation atomic absorption spectrometry (CVGAAS). Volatile species of silver in acidified medium were generated by the reduction of sodium tetrahydroborate; these species were sent to a flame-heated quartz tube atomizer (QTA) following isolation by using a gas-liquid separator. Flow injection (FI) was used for sample introduction. Optimization of parameters such as; concentrations of acid and NaBH4 concentration, flow rates o...

Citation Formats

B. Katırcıoğlu and I. Atılgan, “Kimyasal buhar depolama yöntemi ile büyütülmüş polikristal silisyum ince filmlerin elektrik özellikleri,” 1989. Accessed: 00, 2022. [Online]. Available: https://hdl.handle.net/11511/95669.