Development of a selective wet-chemical etchant for precise 3D sculpting of silicon enabled by infrared non-linear laser modification

Date

2024-09-01

Author

Zolfaghari Borra, Mona
Radfar, Behrad
Nasser, Hisham
Çolakoğlu, Tahir
Tokel, Onur
Turnalı, Ahmet
Işık Taşgın, Dilek
Toffoli, Hande
Toffoli, Daniele
İlday, Fatih Ömer
Turan, Raşit
Pavlov, Ihor
Bek, Alpan

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Recently-demonstrated high-quality three-dimensional (3D) subsurface laser processing inside crystalline silicon (c-Si) wafers opens a door to a wide range of novel applications in multidisciplinary research areas. Using this technique, novel maskless micro-pillars with precise control on the surface reflection and coverage are successfully fabricated by etching the laser-processed region of the c-Si wafer. To achieve this, a particular selective wet chemical etching is developed to follow subsurface laser processing of c-Si to reveal the desired 3D structures with smooth surfaces. Here, we report the development of a novel chromium-free chemical etching recipe based on copper nitrate, which yields substantially smooth surfaces at a high etch rate and selectivity on the both laser-processed Si surface and subsurface, i.e., without significant etching of the unmodified Si. Our results show that the etch rate and surface morphology are interrelated and strongly influenced by the composition of the adopted etching solution. After an extensive compositional study performed at room temperature, we identify an etchant with a selectivity of over 1600 times for laser-modified Si with respect to unmodified Si. We also support our findings using density functional theory calculations of HF and Cu adsorption energies, indicating significant diversity on the c-Si and laser-modified surfaces.

Subject Keywords

Amorphous materials, Analytical methods, Laser treatment, Silicon, Wet etching

URI

https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85190351971&origin=inward
https://hdl.handle.net/11511/109351

Collections

Department of Physics, Article