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Metal-assisted nano-textured solar cells with SiO2/Si3N4 passivation
Date
2017-02-01
Author
Es, Fırat
Baytemir, Gulsen
Kulakci, Mustafa
Turan, Raşit
Metadata
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This work is licensed under a
Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License
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We demonstrate the fabrication of nano-sized surface textured crystalline silicon by a metal-assisted electroless etching method with nitric acid added as the hole injection agent. This method generates randomly shaped cone-like structures that offer a clear advantage over nanowires by enabling straightforward passivation with standard techniques. Average reflection values as low as 3% have been achieved. Optimizing the thickness of anti-reflective coatings, the doping depth and the screen-printed metal firing process increases the short circuit current of the cell by 0.82 mA/cm(2) over the reference cells, which had a pyramidal texture without nano texturing.
Subject Keywords
Metal-assisted etching
,
Texturing
,
Silicon solar cells
,
Nano-texture
URI
https://hdl.handle.net/11511/45106
Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
DOI
https://doi.org/10.1016/j.solmat.2016.10.032
Collections
Department of Physics, Article
Citation Formats
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BibTeX
F. Es, G. Baytemir, M. Kulakci, and R. Turan, “Metal-assisted nano-textured solar cells with SiO2/Si3N4 passivation,”
SOLAR ENERGY MATERIALS AND SOLAR CELLS
, vol. 160, pp. 269–274, 2017, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/45106.