Metal-assisted nano-textured solar cells with SiO2/Si3N4 passivation

Date

2017-02-01

Author

Es, Fırat
Baytemir, Gulsen
Kulakci, Mustafa
Turan, Raşit

Metadata

Show full item record

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Item Usage Stats

7
views

0
downloads

Cite This

We demonstrate the fabrication of nano-sized surface textured crystalline silicon by a metal-assisted electroless etching method with nitric acid added as the hole injection agent. This method generates randomly shaped cone-like structures that offer a clear advantage over nanowires by enabling straightforward passivation with standard techniques. Average reflection values as low as 3% have been achieved. Optimizing the thickness of anti-reflective coatings, the doping depth and the screen-printed metal firing process increases the short circuit current of the cell by 0.82 mA/cm(2) over the reference cells, which had a pyramidal texture without nano texturing.

Subject Keywords

Metal-assisted etching, Texturing, Silicon solar cells, Nano-texture

URI

https://hdl.handle.net/11511/45106

Collections

Department of Physics, Article