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Electron Transport Properties of Ga0.51In0.49P for Device Applications

We present Monte Carlo calculations of steady-state and transient electron transport properties of Ga0.51In0.49P. We have made a simulation-based comparison between Ga0.51In0.49P and AlxGa1-xAs (x = 0.2, 0.3). Our Monte Carlo data show that transport properties of Ga0.51In0.49P are favorable, and when the other advantages of the GaInP/GaAs system are also taken into account. this material is a good choice to replace AlxGa1-xAs (x greater-than-or-equal-to 0.3). We have also calculated electron drift and Hall mobilities in Ga0.51In0.49P as a function of impurity concentration and temperature, and determined the effects of different scattering mechanisms on the low-field mobility. Calculated results are in good agreement with the measurements on metal organic chemical vapor deposition (MOCVD) grown samples with Hall mobilities within a factor of 0.5 of the calculated theoretical limit. It has also been found that alloy scattering is an important mobility degrading mechanism in lightly doped material at low temperatures.