High frequency capacitively coupled RF plasma discharge effects on the order/disorder structure of PAN-based carbon fiber

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10.1007s40094-014-0127-7.pdf

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2014-5-14

Author

Güngör, Ümmugül E.
Bilikmen, Sinan
Akbar, Demiral

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High-resolution confocal Raman microscopy was used to investigate the effects of nitrogen plasma on unsized high strength (HS) PAN-based carbon fiber surfaces. The fibers were treated by a high frequency (40.68 MHz) capacitively coupled single RF-PECVD reactor under different processing conditions (exposure times, RF powers and gas pressures). It was found that the order/disorder structure of the treated carbon fiber changed with different processing conditions. At low pressures, the degree of disordered structure increased with HF-RF power and process time. However, at high pressures, high-order structure (IG/IT = 84.51%) was observed and almost no observable structural effects appeared at long treatment time. Also, the first-order Raman-band peaks (D and G) of the treated carbon fibers shifted. And, FWHM (wD/wG), intensity (ID/IG) and D-band relative integrated intensity (ID/IT) ratios increased with ordering whereas they decreased with disordering.

Subject Keywords

Raman-spectroscopy, Composites, Spectra, Band

URI

https://hdl.handle.net/11511/51966

Journal

Journal of Theoretical and Applied Physics

DOI

https://doi.org/10.1007/s40094-014-0127-7

Collections

Department of Physics, Article

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Citation Formats

Ü. E. Güngör, S. Bilikmen, and D. Akbar, “High frequency capacitively coupled RF plasma discharge effects on the order/disorder structure of PAN-based carbon fiber,” Journal of Theoretical and Applied Physics, 2014, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/51966.