Boron and phosphorus doped polycrystalline silicon thin films fabricated by aluminium induced crystallization and solid phase epitaxial thickening techniques

Date

2018-07-04

Author

Tüzün Özmen, Özge
Karaman, Mehmet
Sedani, Salar Habibpur
Şağban, Hüseyin Muzaffer
Turan, Raşit

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https://hdl.handle.net/11511/86123

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Citation Formats

Ö. Tüzün Özmen, M. Karaman, S. H. Sedani, H. M. Şağban, and R. Turan, “Boron and phosphorus doped polycrystalline silicon thin films fabricated by aluminium induced crystallization and solid phase epitaxial thickening techniques,” 2018, Accessed: 00, 2021. [Online]. Available: https://hdl.handle.net/11511/86123.