Oriented assembly and nanofabrication of zeolite A monolayers

Date

2009-12-01

Author

Öztürk, Seçkin
Akata Kurç, Burcu

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A facile and efficient method in order to assemble zeolites for the purpose of generating zeolite nano-micropatterns on the Si wafer was investigated by using e-beam lithography. A monolayer of organized. fully covered and strongly bound zeolite A nanocrystals were formed on the Si wafer substrates without using any chemical linkers. The limits of forming nano sized zeolite A patterns on the Si wafer was tested and it was observed that zeolite A nanocrystals could be assembled on the Si wafers with high precision The limit of the pattern resolution was defined by the size of the zeolite nanocrystal, which was around 250 nm in the Current study. Furthermore, mono and double layers of zeolite A nanocrystals were generated without using any chemical linkers oil the Substrates for the first time. (C) 2009 Elsevier Inc. All rights reserved

Subject Keywords

Zeolite, L-beam lithography, Si wafer, Monolayer

URI

https://hdl.handle.net/11511/31492

Journal

MICROPOROUS AND MESOPOROUS MATERIALS

DOI

https://doi.org/10.1016/j.micromeso.2009.06.010

Collections

Graduate School of Natural and Applied Sciences, Article

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Citation Formats

S. Öztürk and B. Akata Kurç, “Oriented assembly and nanofabrication of zeolite A monolayers,” MICROPOROUS AND MESOPOROUS MATERIALS, pp. 228–233, 2009, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/31492.