Synthesis and characterization of boron carbide films by plasma-enhanced chemical vapor deposition

Date

2003-03-01

Author

Eroglu, OD
Sezgi, Naime Aslı
Ozbelge, HO
Durmazucar, HH

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The plasma-enhanced chemical vapor deposition of boron carbide was investigated on quartz glass and alumina substrates from a gas mixture of BCl3, H-2, and CH4 in an inductively coupled plasma (ICP) medium produced by a radio frequency (RF) discharged onto the gases passing through a tubular reactor under atmospheric pressure. A thin solid boron carbide coating with a gray color was deposited on both substrates. The results of XRD revealed that the major solid phase formed in the coating material was beta-rhombohedral B4C. The SEM analysis showed that the surface homogeneity increased with an increase in the exposure time, and different boron carbide structures were formed at different RF powers and exposure times.

Subject Keywords

Boron carbide, PECVD, XRD, SEM, Coating

URI

https://hdl.handle.net/11511/40674

Journal

CHEMICAL ENGINEERING COMMUNICATIONS

DOI

https://doi.org/10.1080/00986440390183384

Collections

Department of Chemical Engineering, Article

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Citation Formats

O. Eroglu, N. A. Sezgi, H. Ozbelge, and H. Durmazucar, “Synthesis and characterization of boron carbide films by plasma-enhanced chemical vapor deposition,” CHEMICAL ENGINEERING COMMUNICATIONS, pp. 360–372, 2003, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/40674.