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Alternative HF-free etching solution for aluminum induced texturing of glass surface with improved haze
Date
2019-08-01
Author
Ünal, Mustafa
TANKUT, Aydın
Turan, Raşit
Metadata
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This work is licensed under a
Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License
.
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Aluminum induced texturing (AIT) is a promising surface conditioning method applied on glass substrates. In conventional AIT process, the reaction products (i.e., Al2O3 and Si) are stripped off the glass surface using an HF-based solution, rendering the process sensitive to etch duration. In this study, an alternative, HF-free chemistry is compared to conventional HF-based etching. We show that newly proposed alkaline-based solution leads to significantly improved diffused transmission, of up to 80%. In addition, the etchant does not interact with the glass surface, enabling effective process control.
Subject Keywords
Electronic, Optical and Magnetic Materials
,
Surfaces, Coatings and Films
,
Polymers and Plastics
,
Metals and Alloys
,
Biomaterials
URI
https://hdl.handle.net/11511/40691
Journal
MATERIALS RESEARCH EXPRESS
DOI
https://doi.org/10.1088/2053-1591/ab2669
Collections
Center for Solar Energy Research and Applications (GÜNAM), Article