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Alternative HF-free etching solution for aluminum induced texturing of glass surface with improved haze

Aluminum induced texturing (AIT) is a promising surface conditioning method applied on glass substrates. In conventional AIT process, the reaction products (i.e., Al2O3 and Si) are stripped off the glass surface using an HF-based solution, rendering the process sensitive to etch duration. In this study, an alternative, HF-free chemistry is compared to conventional HF-based etching. We show that newly proposed alkaline-based solution leads to significantly improved diffused transmission, of up to 80%. In addition, the etchant does not interact with the glass surface, enabling effective process control.