Alternative HF-free etching solution for aluminum induced texturing of glass surface with improved haze

Date

2019-08-01

Author

Ünal, Mustafa
TANKUT, Aydın
Turan, Raşit

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This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

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Aluminum induced texturing (AIT) is a promising surface conditioning method applied on glass substrates. In conventional AIT process, the reaction products (i.e., Al2O3 and Si) are stripped off the glass surface using an HF-based solution, rendering the process sensitive to etch duration. In this study, an alternative, HF-free chemistry is compared to conventional HF-based etching. We show that newly proposed alkaline-based solution leads to significantly improved diffused transmission, of up to 80%. In addition, the etchant does not interact with the glass surface, enabling effective process control.

Subject Keywords

Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films, Polymers and Plastics, Metals and Alloys, Biomaterials

URI

https://hdl.handle.net/11511/40691

Collections

Center for Solar Energy Research and Applications (GÜNAM), Article