Low temperature thermally stimulated current measurements in N-implanted TlGaSeS layered single crystals

Date

2015-06-01

Author

YILDIRIM, TACETTİN
Sulunhat, B.
Hasanlı, Nızamı

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As-grown TlGaSeS crystals have been implanted by a ion implantation technique. The samples were bombarded at room temperature in the direction perpendicular to the layer by nitrogen ion beam of about 120 keV having dose of 1 x 10(16) ions/cm(2). The effect of N implantation and annealing at 300 degrees C was studied by using thermally stimulated current measurements. The measurements were performed in temperatures ranging from 10 K to 250 K. The experimental evidences were found for the presence of one shallow electron trapping center and one deep hole trapping center with activation energies of 6 meV and 796 meV, respectively. The capture cross-sections (3.0 x 10(-24) cm(2) and 2.3 x 10(-15) cm(2)) and concentrations (5.6 x 10(11) cm(-3) and 2.1 x 10(13) cm(-3)) were determined for the electron and hole trapping centers, respectively.

Subject Keywords

Electrical properties, Defects, Crystal growth, Chalcogenides, Semiconductors

URI

https://hdl.handle.net/11511/41291

Journal

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

DOI

https://doi.org/10.1016/j.mssp.2015.02.026

Collections

Department of Physics, Article

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Citation Formats

T. YILDIRIM, B. Sulunhat, and N. Hasanlı, “Low temperature thermally stimulated current measurements in N-implanted TlGaSeS layered single crystals,” MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, pp. 121–125, 2015, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/41291.