Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography

Date

2015-03-01

Author

Bat, Erhan
Lau, Uland Y.
Maynard, Heather D.

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Direct-write patterning of multiple proteins on surfaces is of tremendous interest for a myriad of applications. Precise arrangement of different proteins at increasingly smaller dimensions is a fundamental challenge to apply the materials in tissue engineering, diagnostics, proteomics and biosensors. Herein, we present a new resist that protects proteins during electron-beam exposure and its application in direct-write patterning of multiple proteins. Polymers with pendant trehalose units are shown to effectively crosslink to surfaces as negative resists, while at the same time providing stabilization to proteins during the vacuum and electron-beam irradiation steps. In this manner, arbitrary patterns of several different classes of proteins such as enzymes, growth factors and immunoglobulins are realized. Utilizing the high-precision alignment capability of electron-beam lithography, surfaces with complex patterns of multiple proteins are successfully generated at the micrometre and nanometre scale without requiring cleanroom conditions.

Subject Keywords

General Biochemistry, Genetics and Molecular Biology, General Physics and Astronomy, General Chemistry

URI

https://hdl.handle.net/11511/46600

Journal

NATURE COMMUNICATIONS

DOI

https://doi.org/10.1038/ncomms7654

Collections

Department of Chemical Engineering, Article

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Citation Formats

E. Bat, U. Y. Lau, and H. D. Maynard, “Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography,” NATURE COMMUNICATIONS, pp. 0–0, 2015, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/46600.