Growth and process conditions of aligned and patternable films of iron(III) oxide nanowires by thermal oxidation of iron

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Date

2008-11-12

Author

Hiralal, P.
Ünalan, Hüsnü Emrah
Wijayantha, K. G. U.
Kursumovic, A.
Jefferson, D.
MacManus-Driscoll, J. L.
Amaratunga, G. A. J.

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A simple, catalyst-free growth method for vertically aligned, highly crystalline iron oxide (alpha-Fe2O3) wires and needles is reported. Wires are grown by the thermal oxidation of iron foils. Growth properties are studied as a function of temperature, growth time and oxygen partial pressure. The size, morphology and density of the nanostructures can be controlled by varying growth temperature and time. Oxygen partial pressure shows no effect on the morphology of resulting nanostructures, although the oxide thickness increases with oxygen partial pressure. Additionally, by using sputtered iron films, the possibility of growth and patterning on a range of different substrates is demonstrated. Growth conditions can be adapted to less tolerant substrates by using lower temperatures and longer growth time. The results provide some insight into the mechanism of growth.

Subject Keywords

Mechanical Engineering, Electrical and Electronic Engineering, General Materials Science, Mechanics of Materials, Bioengineering, General Chemistry

URI

https://hdl.handle.net/11511/48185

Journal

NANOTECHNOLOGY

DOI

https://doi.org/10.1088/0957-4484/19/45/455608

Collections

Department of Metallurgical and Materials Engineering, Article

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Citation Formats

P. Hiralal et al., “Growth and process conditions of aligned and patternable films of iron(III) oxide nanowires by thermal oxidation of iron,” NANOTECHNOLOGY, pp. 0–0, 2008, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/48185.