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Bismuth nano-Hall probes fabricated by focused ion beam milling for direct magnetic imaging by room temperature scanning Hall probe microscopy
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Date
2001-10-25
Author
SANDHU, A
MASUDA, H
KUROSAWA, K
Oral, Ahmet
BENDİNG, SJ
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Bismuth nano-Hall probes with dimensions similar to 120 x 120 nm were fabricated by focused ion beam milling and used for the direct room temperature magnetic imaging of crystalline garnet thin films and strontium ferrite permanent magnets by scanning Hall probe microscopy. At driving currents of 40 muA, the Hall coefficient and magnetic field sensitivity of the Bi nano-Hall probes were 3.3 x 10(-4) CYG and 7.2 G/root Hz, respectively.
Subject Keywords
Electrical and Electronic Engineering
URI
https://hdl.handle.net/11511/48538
Journal
ELECTRONICS LETTERS
DOI
https://doi.org/10.1049/el:20010908
Collections
Department of Physics, Article
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A. SANDHU, H. MASUDA, K. KUROSAWA, A. Oral, and S. BENDİNG, “Bismuth nano-Hall probes fabricated by focused ion beam milling for direct magnetic imaging by room temperature scanning Hall probe microscopy,”
ELECTRONICS LETTERS
, pp. 1335–1336, 2001, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/48538.