Bismuth nano-Hall probes fabricated by focused ion beam milling for direct magnetic imaging by room temperature scanning Hall probe microscopy

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Date

2001-10-25

Author

SANDHU, A
MASUDA, H
KUROSAWA, K
Oral, Ahmet
BENDİNG, SJ

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Bismuth nano-Hall probes with dimensions similar to 120 x 120 nm were fabricated by focused ion beam milling and used for the direct room temperature magnetic imaging of crystalline garnet thin films and strontium ferrite permanent magnets by scanning Hall probe microscopy. At driving currents of 40 muA, the Hall coefficient and magnetic field sensitivity of the Bi nano-Hall probes were 3.3 x 10(-4) CYG and 7.2 G/root Hz, respectively.

Subject Keywords

Electrical and Electronic Engineering

URI

https://hdl.handle.net/11511/48538

Journal

ELECTRONICS LETTERS

DOI

https://doi.org/10.1049/el:20010908

Collections

Department of Physics, Article

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Citation Formats

A. SANDHU, H. MASUDA, K. KUROSAWA, A. Oral, and S. BENDİNG, “Bismuth nano-Hall probes fabricated by focused ion beam milling for direct magnetic imaging by room temperature scanning Hall probe microscopy,” ELECTRONICS LETTERS, pp. 1335–1336, 2001, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/48538.