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Effects of boron doping on solid phase crystallization of in situ doped amorphous Silicon thin films prepared by electron beam evaporation
Date
2020-01-31
Author
Sedani, Salar H.
Yasar, Ozlen F.
Karaman, Mehmet
Turan, Raşit
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In this work, we studied solid-phase crystallization of boron-doped non-hydrogenated amorphous Si films fabricated by electron beam evaporation equipped with effusion cells (e-Beam EC) on silicon nitride coated glass substrates. We investigated the effect of boron doping on the crystallization kinetics through a series of experiments with different boron doping concentrations controlled by the effusion cell temperature. We employed Raman spectroscopy, time-of-flight secondary ion mass spectroscopy, grazing incidence X-ray diffraction, Hall Effect measurement and X-ray photoelectron spectroscopy (XPS) to understand the structural and electrical variations with regard to B doping and process conditions. We found that the stress in the poly-Si thin film increases when the B concentration increases from 10(18) to 10(20) atoms/cm(3), reaching a value of to 1087.5 MPa. We also studied the chemical environment around the B atoms by comparing the B-1s, binding energies in XPS measurements, which revealed that B-Si coordination does not change upon crystallization. The electrical effect of boron doping was observed in a drastic drop in resistivity from orders of 10(2) to the 10(-3) Omega.cm. Moreover, we found that an increase in boron doping concentration leads to a higher crystallization rate of non-hydrogenated amorphous silicon thin films prepared by e-Beam EC.
Subject Keywords
Materials Chemistry
,
Electronic, Optical and Magnetic Materials
,
Surfaces, Coatings and Films
,
Surfaces and Interfaces
,
Metals and Alloys
URI
https://hdl.handle.net/11511/48761
Journal
THIN SOLID FILMS
DOI
https://doi.org/10.1016/j.tsf.2019.137639
Collections
Department of Physics, Article
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S. H. Sedani, O. F. Yasar, M. Karaman, and R. Turan, “Effects of boron doping on solid phase crystallization of in situ doped amorphous Silicon thin films prepared by electron beam evaporation,”
THIN SOLID FILMS
, pp. 0–0, 2020, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/48761.