Coexistence of colossal stress and texture gradients in sputter deposited nanocrystalline ultra-thin metal films

2014-12-01
Kuru, Yener
Welzel, Udo
Mittemeijer, Eric J.
This paper demonstrates experimentally that ultra-thin, nanocrystalline films can exhibit coexisting colossal stress and texture depth gradients. Their quantitative determination is possible by X-ray diffraction experiments. Whereas a uniform texture by itself is known to generally cause curvature in so-called sin (2)psi plots, it is shown that the combined action of texture and stress gradients provides a separate source of curvature in sin (2)psi plots (i.e., even in cases where a uniform texture does not induce such curvature). On this basis, the texture and stress depth profiles of a nanocrystalline, ultra-thin (50 nm) tungsten film could be determined. (c) 2014 AIP Publishing LLC.

Citation Formats
Y. Kuru, U. Welzel, and E. J. Mittemeijer, “Coexistence of colossal stress and texture gradients in sputter deposited nanocrystalline ultra-thin metal films,” APPLIED PHYSICS LETTERS, vol. 105, no. 22, pp. 0–0, 2014, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/58039.