Coexistence of colossal stress and texture gradients in sputter deposited nanocrystalline ultra-thin metal films

Date

2014-12-01

Author

Kuru, Yener
Welzel, Udo
Mittemeijer, Eric J.

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This paper demonstrates experimentally that ultra-thin, nanocrystalline films can exhibit coexisting colossal stress and texture depth gradients. Their quantitative determination is possible by X-ray diffraction experiments. Whereas a uniform texture by itself is known to generally cause curvature in so-called sin (2)psi plots, it is shown that the combined action of texture and stress gradients provides a separate source of curvature in sin (2)psi plots (i.e., even in cases where a uniform texture does not induce such curvature). On this basis, the texture and stress depth profiles of a nanocrystalline, ultra-thin (50 nm) tungsten film could be determined. (c) 2014 AIP Publishing LLC.

URI

https://hdl.handle.net/11511/58039

Journal

APPLIED PHYSICS LETTERS

DOI

https://doi.org/10.1063/1.4902940

Collections

Department of Metallurgical and Materials Engineering, Article

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Citation Formats

Y. Kuru, U. Welzel, and E. J. Mittemeijer, “Coexistence of colossal stress and texture gradients in sputter deposited nanocrystalline ultra-thin metal films,” APPLIED PHYSICS LETTERS, pp. 0–0, 2014, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/58039.