Polyfluorene Thin Films Synthesized by a Novel Plasma Polymerization Method

Date

2012-02-01

Author

GÖKTAŞ, HİLAL
Mansuroğlu, Doğan
ATALAY, BETÜL
Bilikmen, Sinan
KAYA, İSMET

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The synthesis of polyfluorene (PF) thin films by simultaneously superposing a continuous and pulsed discharge and the characterizations of these samples are presented. The double discharge plasma system is constructed by superposing two discharges; namely, a low pressure dc glow one and a high current pulsed one. The fluorene monomer in powder form was vaporized in the system at argon plasma without any modification, at 0.5 mbar operating pressure. The structure of the thin films was investigated via XPS, UV-visible, FTIR, XRD and SEM. The FTIR and the UV-visible results revealed that the fluorene structure was retained at the produced samples. Semi-conducting behavior was established, and upon the iodine doping, the optical energy band gap (E-g) dropped down from 3.7 to 2.4 eV. The morphology of the synthesized PF thin films was amorphous, with granular structures of different sizes depending on the location of the substrate.

Subject Keywords

Double discharge, Filamentary discharge, Plasma polymerization, Polyfluorene, Thin films

URI

https://hdl.handle.net/11511/62976

Journal

PLASMA CHEMISTRY AND PLASMA PROCESSING

DOI

https://doi.org/10.1007/s11090-011-9334-z

Collections

Department of Physics, Article

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Citation Formats

H. GÖKTAŞ, D. Mansuroğlu, B. ATALAY, S. Bilikmen, and İ. KAYA, “Polyfluorene Thin Films Synthesized by a Novel Plasma Polymerization Method,” PLASMA CHEMISTRY AND PLASMA PROCESSING, pp. 35–44, 2012, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/62976.