Micro processing by intense fast electron beam

Goktas, H
Kirkici, H
Oke, G
Udrea, M
Generation of intense electron beams by superposing two discharges, namely a low pressure do glow discharge and a high current pulsed discharge at pressures and voltages very similar to that of the pseudo-spark gap devices, has been reported previously [1, 2]. The small diameter, high peak current and short pulse length are the characteristics of the electron beam generated using this technique. In this technique, no high vacuum facilities are necessary, and many applications such as micro processing, X-rays generation, pre-ionization for high-power lasers are feasible. The electron beam current is in the range of 10-30 A. A full characterization of the electron beam that is utilized in this work has been given in a previous work [3]. In this work it is reported that the most energetic part of the electron beam is about 5-nanosecond pulse duration. The beam is magnetically deflected to the specific point. The pulse repetition rate is up to 100 Hz. Micro-processing as drilling tenths of microns diameter holes in different materials such as copper, titanium, tantalum has been performed. The microstructure of the irradiated materials has been investigated by means of SEM and AFM. Currently, the possibility of processing a matrix of holes is being considered.


A mass spectrometric study on plasma reactions of styrene and methyl methacrylate
Özden (Orhan), Bilge; Hacaloğlu, Jale; Akovali, Güneri (1991-01-01)
High frequency gas discharge plasma reactions of styrene and methyl methacrylate at low pressure have been studied mass spectrometrically. When styrene was used as a monomer, the most important reaction was plasma state polymerization; some decomposition of styrene and the formation of a small amount of C2H4 were detected. Under the same conditions, methyl methacrylate was decomposed mainly to CO, CO2 and C2H4.
Microprocessing by intense pulsed electron beam
Goktas, H; Kirkici, H; Oke, G; Udrea, AV (Institute of Electrical and Electronics Engineers (IEEE), 2002-10-01)
Generation of intense electron beams by superposing two discharges, namely, a low-pressure dc glow discharge and a high-current pulsed discharge at pressures and voltages very similar to that of the pseudospark gap devices, has been studied. The small beam diameter, high peak current, and short pulse length are the characteristics of the electron beam generated using this technique. This technique does not require high vacuum facilities, and applications such as microprocessing, X-ray generation, and preion...
Polyfluorene Thin Films Synthesized by a Novel Plasma Polymerization Method
GÖKTAŞ, HİLAL; Mansuroğlu, Doğan; ATALAY, BETÜL; Bilikmen, Sinan; KAYA, İSMET (2012-02-01)
The synthesis of polyfluorene (PF) thin films by simultaneously superposing a continuous and pulsed discharge and the characterizations of these samples are presented. The double discharge plasma system is constructed by superposing two discharges; namely, a low pressure dc glow one and a high current pulsed one. The fluorene monomer in powder form was vaporized in the system at argon plasma without any modification, at 0.5 mbar operating pressure. The structure of the thin films was investigated via XPS, U...
Interaction of a Narrow Gap Glow Discharge Plasma with Far Infrared Radiation
Alasgarzade, N.; Takan, Taylan; Mansuroglu, D.; ŞAHİN, ASAF BEHZAT; Uzun Kaymak, İlker Ümit; Altan, Hakan (2016-09-30)
Commercially available neon indicator lamps (also known as Glow Discharge Detectors) are low-cost, sensitive detectors operating at room temperature for mm-wave/Terahertz detection. Furthermore, their high speed operation make them attractive from the stand-point of applications in the far-infrared region of the spectrum, however questions still remain regarding the mechanisms involved in the detection of this type of radiation. In order to study the plasmas generated in these lamps, a DC gas discharge cham...
ULGEN, A; DOGAN, M; Gökmen, Ali; YALCIN, S (1993-01-01)
The Ar spectral lines are suppressed in Grimm-type glow discharge lamp atomic emission spectrometry (GDL-AES) by a double voltage modulation technique. The GDL is modulated between two voltage levels, typically 400 and 700 V. At the lower voltage level mainly Ar emission contributes whereas at the higher voltage level both Ar and atoms sputtered from the cathode contribute to the emission. The Ar emission spectrum at the lower voltage level is multiplied by a constant factor to scale it up to the same level...
Citation Formats
H. Goktas, H. Kirkici, G. Oke, and M. Udrea, “Micro processing by intense fast electron beam,” 2001, p. 397, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/67514.