Effect of heat treatment on the stress and structure evolution of plasma deposited boron nitride thin films

Date

2008-03-25

Author

Anutgan, T. Aliyeva
Anutgan, M.
Wdemir, O.
Atilgan, I.
Katircioglu, B.

Metadata

Show full item record

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Item Usage Stats

69
views

0
downloads

Boron nitride (BN) thin films are deposited at 573 K by plasma enhanced chemical vapor deposition (PECVD) with ammonia (NH3) and hydrogen diluted diborane (15% B2H6 in H-2) source gases. UV-visible and Fourier transform infrared (FTIR) spectroscopies together with surface profilometry are used for the film characterization. These films are hydrogenated (BN:H) whose hydrogen content is pursued following the 1.5 h annealing process at 748 K, 923 K and 1073 K under nitrogen atmosphere. Hydrogen escape with the rising annealing temperature is observed together with increases of the compressive stress, band gap and Urbach energies. Films are composed of the hexagonal BN (h-BN) clusters that grow dominantly parallel to the substrate surface with some non-parallel planes at the edges of the clusters, which are embedded in an amorphous tissue (the so-called turbostratic structure, t-BN). Annealing seems to promote non-parallel planes, thus creating more stressful and distorted network. Most of hydrogen atoms are removed from the film annealed at 1073 K and wurtzite BN (w-BN) phase is formed with volume fraction of 57%. As a consequence or in parallel of hydrogen reduction, high compressive stress causes the cracking of the films.

Subject Keywords

Materials Chemistry, General Chemistry, Surfaces, Coatings and Films, Surfaces and Interfaces, Condensed Matter Physics

URI

https://hdl.handle.net/11511/68182

Journal

SURFACE & COATINGS TECHNOLOGY

DOI

https://doi.org/10.1016/j.surfcoat.2007.11.008

Collections

Department of Physics, Article

Suggestions

OpenMETU
Core

Effects of gold-induced crystallization process on the structural and electrical properties of germanium thin films Kabacelik, Ismail; Kulakci, Mustafa; Turan, Raşit; ÜNAL, NURİ (Wiley, 2018-07-01) Gold-induced (Au-) crystallization of amorphous germanium (-Ge) thin films was investigated by depositing Ge on aluminum-doped zinc oxide and glass substrates through electron beam evaporation at room temperature. The influence of the postannealing temperatures on the structural properties of the Ge thin films was investigated by employing Raman spectra, X-ray diffraction, and scanning electron microscopy. The Raman and X-ray diffraction results indicated that the Au-induced crystallization of the Ge films ...
Effect of hydrogenation on B/Si(001)-(1 x 2) Cakmak, M.; Mete, E.; Ellialtıoğlu, Süleyman Şinasi (Elsevier BV, 2007-09-15) Ab initio calculations, based on pseudopotentials and density functional theory, have been performed to investigate the effect of hydrogenation on the atomic geometries and the energetics of substitutional boron on the generic Si(001)-(1 x 2) surface. For a single B atom substitution corresponding to 0.5 ML coverage, we have considered two different sites: (i) the mixed Si-B dimer structure and (ii) boron substituting for the second-layer Si to form Si-B back-bond structure, which is energetically more favo...
Effect of Carbon Nanotube Purification on the Electrical and Mechanical Properties of Poly(ethylene terephthalate) Composites with Carbon Nanotubes in Low Concentration Yesil, Sertan; Bayram, Göknur (Wiley, 2011-03-15) Surface properties of carbon nanotubes (CNTs) were altered by purification with nitric acid, sulfuric acid, ammonium hydroxide, and hydrogen peroxide. As-received and purified CNT-based conductive poly( ethylene terephthalate) composites were prepared with a twin-screw extruder. The effects of CNT purification on the surface properties of the CNTs and on the morphology and electrical and mechanical properties of CNT-based composites were investigated. Surface energy measurements showed that the acidic compo...
Effect of oxygen flow rate on the low temperature deposition of titanium monoxide thin films via electron beam evaporation Cosar, Mustafa Burak; Icli, Kerem Cagatay; Ozenbas, Macit (American Vacuum Society, 2019-05-01) In this study, titanium monoxide thin films were evaporated by an electron beam source under different oxygen atmospheres at deposition temperatures not exceeding 80 degrees C. Deposition of thin films at low temperatures is a prerequisite for heat sensitive substrates. XRD results showed that crystallinity of titanium monoxide is achieved without the requirement of high temperature annealing. When oxygen is introduced into the coating chamber, a titanium peak is formed at exactly the Ti+2 position together...
Stability and degradation of plasma deposited boron nitride thin films in ambient atmosphere Anutgan, Tamila Aliyeva; Anutgan, Mustafa; Atilgan, Ismail; Katircioglu, Bayram (Elsevier BV, 2009-11-02) Boron nitride (BN) thin films were deposited at 296 K, 398 K, 523 K and 623 K by low power radio frequency plasma enhanced chemical vapor deposition with nitrogen (N-2.) and hydrogen diluted diborane (15% B2H6 in H-2) source gases. Fourier transform infrared and UV-visible spectroscopies were used to investigate the stability and degradation of BN films under ambient air conditions. The action of moisture on the films is reduced with increasing substrate temperature (T-s) to the detriment of the film growth...

Citation Formats

T. A. Anutgan, M. Anutgan, O. Wdemir, I. Atilgan, and B. Katircioglu, “Effect of heat treatment on the stress and structure evolution of plasma deposited boron nitride thin films,” SURFACE & COATINGS TECHNOLOGY, pp. 3058–3066, 2008, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/68182.