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Optical characterization of silicon based hydrogenated amorphous thin films by un-visible and infrared measurements
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Date
2006
Author
Kılıç, İlker
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Various carbon content hydrogenated amorphous silicon carbide (a-Si1ŁxCx:H) and hydrogenated amorphous silicon (a-Si:H) thin films have been deposited on various substrates by using plasma enhanced chemical vapour deposition (PECVD) technique. Transmission spectra of these films have been determined within UV-Visible region and the obtained data were analysed to find related physical constants such as; refractive indices, thicknesses, etc. Fourier transform infrared (FT-IR) spectrometry technique has been used to determine transmission & reflection type spectra of these films. Obtained data were analysed to determine bond structures of the films. E®ects of relative concentration of ethylene (C2H4) gas on thin film bond structure and on optical constants have been questioned
Subject Keywords
Spectroscopy.
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http://etd.lib.metu.edu.tr/upload/2/12607013/index.pdf
https://hdl.handle.net/11511/15647
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Graduate School of Natural and Applied Sciences, Thesis
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İ. Kılıç, “Optical characterization of silicon based hydrogenated amorphous thin films by un-visible and infrared measurements,” M.S. - Master of Science, Middle East Technical University, 2006.
