Optical characterization of silicon based hydrogenated amorphous thin films by un-visible and infrared measurements

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2006
Kılıç, İlker
Various carbon content hydrogenated amorphous silicon carbide (a-Si1ŁxCx:H) and hydrogenated amorphous silicon (a-Si:H) thin films have been deposited on various substrates by using plasma enhanced chemical vapour deposition (PECVD) technique. Transmission spectra of these films have been determined within UV-Visible region and the obtained data were analysed to find related physical constants such as; refractive indices, thicknesses, etc. Fourier transform infrared (FT-IR) spectrometry technique has been used to determine transmission & reflection type spectra of these films. Obtained data were analysed to determine bond structures of the films. E®ects of relative concentration of ethylene (C2H4) gas on thin film bond structure and on optical constants have been questioned

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Citation Formats
İ. Kılıç, “Optical characterization of silicon based hydrogenated amorphous thin films by un-visible and infrared measurements,” M.S. - Master of Science, Middle East Technical University, 2006.