Show/Hide Menu
Hide/Show Apps
Logout
Türkçe
Türkçe
Search
Search
Login
Login
OpenMETU
OpenMETU
About
About
Open Science Policy
Open Science Policy
Open Access Guideline
Open Access Guideline
Postgraduate Thesis Guideline
Postgraduate Thesis Guideline
Communities & Collections
Communities & Collections
Help
Help
Frequently Asked Questions
Frequently Asked Questions
Guides
Guides
Thesis submission
Thesis submission
MS without thesis term project submission
MS without thesis term project submission
Publication submission with DOI
Publication submission with DOI
Publication submission
Publication submission
Supporting Information
Supporting Information
General Information
General Information
Copyright, Embargo and License
Copyright, Embargo and License
Contact us
Contact us
Two-Dimensional Numerical Analysis of Phosphorus Diffused Emitters on Black Silicon Surfaces
Date
2018-07-06
Author
TÜRKAY, Deniz
Yerci, Selçuk
Metadata
Show full item record
This work is licensed under a
Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License
.
Item Usage Stats
266
views
0
downloads
Cite This
In this work, we present an analysis on electrical performance of phosphorus diffused emitters on black silicon surfaces through two-dimensional simulations. In particular, we focus on the extraction and analysis of the emitter saturation current density (J(0e)), the sheet resistance (R-sh), spatial collection efficiency profile and relatedly J(sc) of a solar cell. Using process simulations, we form emitters on periodic triangular structures with various aspect ratios (R) and emitter profiles. We show that for high aspect ratio and highly-doped structures, the trend of increasing J(0e) with junction depth, observed for planar structures, is reversed. While R-sh increase with aspect ratio for shallow emitters, it is weakly dependent on aspect ratio for deep emitters, irrespective of the peak dopant concentration. For highly-doped emitters, the losses in J(sc) can be excessive if the junction depth is larger than the texture size. These losses are negligible for lightly-doped emitters regardless of aspect ratio and junction depth. The trends presented in this study for high aspect ratio emitters in comparison with one-dimensional emitters are expected to provide guidance in the identification of non-idealities that are observed in emitters formed on black silicon surfaces, such as additional surface and bulk defects.
Subject Keywords
Emitter
,
Phosphorus
,
Electrical
,
Simulation
URI
https://hdl.handle.net/11511/31595
DOI
https://doi.org/10.1109/pvcon.2018.8523912
Collections
Graduate School of Natural and Applied Sciences, Conference / Seminar
Suggestions
OpenMETU
Core
Application of computer-aided injection moulding simulation for thermoplastic materials
Onalir, B; Kaftanoglu, B; Balkan, Raif Tuna (1998-01-01)
This paper presents the computer-aided simulation of an injection moulding process for thermoplastic materials. The reasons for using computer simulation for the injection moulding process are discussed together with description of the mould-filling and cooling phenomena. The paper also traces the difficulties in transferring the geometry of the part database from a computer-aided design environment to a computer-aided analysis environment by proposing several solutions for plastic products. Details of simu...
A Detailed Analysis for the Absorption Coefficient of Multilevel Uncooled Infrared Detectors
Küçük, Serhat; Akın, Tayfun (2011-04-29)
This paper introduces a detailed analysis on the calculation of the absorption coefficient of multilevel uncooled infrared detectors. The analysis is carried out considering a two-level 25 mu m pixel pitch infrared detector with a sandwich type resistor which is divided into sub-regions consisting of different stacks of layers. The absorption coefficients of these different sub-regions are calculated individually by using the cascaded transmission line model, including the main body, arms, and the regions w...
Experimental investigation of effects of cutting parameters on surface roughness in the WEDM process
Gökler, Mustafa İlhan (2000-10-01)
The experimental study presented in this paper aims to select the most suitable cutting and offset parameter combination for the wire electrical discharge machining process in order to get the desired surface roughness value for the machined workpieces. A series of experiments have been performed on 1040 steel material of thicknesses 30, 60 and 80 mm, and on 2379 and 2738 steel materials of thicknesses 30 and 60 mm. The test specimens have been cut by using different cutting and offset parameter combination...
Modelling and noise analysis of closed-loop capacitive sigma-delta mems accelerometer
Boğa, Biter; Külah, Haluk; Department of Electrical and Electronics Engineering (2009)
This thesis presents a detailed SIMULINK model for a conventional capacitive Σ-Δ accelerometer system consisting of a MEMS accelerometer, closed-loop readout electronics, and signal processing units (e.g. decimation filters). By using this model, it is possible to estimate the performance of the full accelerometer system including individual noise components, operation range, open loop sensitivity, scale factor, etc. The developed model has been verified through test results using a capacitive MEMS accelero...
Development of mems technology based microwave and millimeter-wave components
Çetintepe, Çağrı; Demir, Şimşek; Department of Electrical and Electronics Engineering (2010)
This thesis presents development of microwave lumped elements for a specific surface-micromachining based technology, a self-contained mechanical characterization of fixed-fixed type beams and realization of a shunt, capacitive-contact RF MEMS switch for millimeter-wave applications. Interdigital capacitor, planar spiral inductor and microstrip patch lumped elements developed in this thesis are tailored for a surface-micromachining technology incorporating a single metallization layer, which allows an easy ...
Citation Formats
IEEE
ACM
APA
CHICAGO
MLA
BibTeX
D. TÜRKAY and S. Yerci, “Two-Dimensional Numerical Analysis of Phosphorus Diffused Emitters on Black Silicon Surfaces,” 2018, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/31595.