Preparation and microstructural characterization of oriented titanosilicate ETS-10 thin films on indium tin oxide surfaces

2010-06-01
Galioglu, Sezin
Ismail, Mariam N.
Warzywoda, Juliusz
Sacco, Albert
Akata Kurç, Burcu
Oriented polycrystalline ETS-10 thin films (average thickness similar to 1.50-1.75 mu m) were prepared on the ITO glass substrates using secondary growth of ETS-10 multilayers with a partial a(b)-out-of-plane preferred crystal orientation. After secondary growth, the films showed a columnar grain microstructure, and a significantly increased degree of a(b)-out-of-plane orientation. This orientation is desirable for advanced applications of ETS-10 films. The prepared films were strongly attached to the ITO glass substrates as evidenced by the absence of discernible differences in the substrate coverage with film after a 60-min ultrasonication in water.
Citation Formats
S. Galioglu, M. N. Ismail, J. Warzywoda, A. Sacco, and B. Akata Kurç, “Preparation and microstructural characterization of oriented titanosilicate ETS-10 thin films on indium tin oxide surfaces,” pp. 401–406, 2010, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/31911.