Show/Hide Menu
Hide/Show Apps
Logout
Türkçe
Türkçe
Search
Search
Login
Login
OpenMETU
OpenMETU
About
About
Open Science Policy
Open Science Policy
Open Access Guideline
Open Access Guideline
Postgraduate Thesis Guideline
Postgraduate Thesis Guideline
Communities & Collections
Communities & Collections
Help
Help
Frequently Asked Questions
Frequently Asked Questions
Guides
Guides
Thesis submission
Thesis submission
MS without thesis term project submission
MS without thesis term project submission
Publication submission with DOI
Publication submission with DOI
Publication submission
Publication submission
Supporting Information
Supporting Information
General Information
General Information
Copyright, Embargo and License
Copyright, Embargo and License
Contact us
Contact us
An 80x80 Microbolometer Type Thermal Imaging Sensor using the LWIR-Band CMOS Infrared (CIR) Technology
Date
2017-04-13
Author
Tankut, Firat
Cologlu, Mustafa H.
Askar, Hidir
Ozturk, Hande
Dumanli, Hilal K.
Oruc, Feyza
Tilkioglu, Bilge
Ugur, Beril
Akar, Orhan Sevket
Tepegoz, Murat
Akın, Tayfun
Metadata
Show full item record
This work is licensed under a
Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License
.
Item Usage Stats
345
views
0
downloads
Cite This
This paper introduces an 80x80 microbolometer array with a 35 mu m pixel pitch operating in the 8-12 aem wavelength range, where the detector is fabricated with the LWIR-band CMOS infrared technology, shortly named as CIR, which is a novel microbolometer implementation technique developed to reduce the detector cost in order to enable the use of microbolometer type sensors in high volume markets, such as the consumer market and IoT. Unlike the widely used conventional surface micromachined microbolometer approaches, MikroSens' CIR detector technology does not require the use of special high TCR materials like VOx or a-Si, instead, it allows to implement microbolometers with standard CMOS layers, where the suspended bulk micromachined structure is obtained by only few consecutive selective MEMS etching steps while protecting the wirebond pads with a simple lithograpy step. This approach not only reduces the fabrication cost but also increases the production yield. In addition, needing simple subtractive post-CMOS fabrication steps allows the CIR technology to be carried out in any CMOS and MEMS foundry in a truly fabless fashion, where industrially mature and Au-free wafer level vacuum packaging technologies can also be carried out, leading to cost advantage, simplicity, scalability, and flexibility. The CIR approach is used to implement an 80x80 FPA with 35 mu m pixel pitch, namely MS0835A, using a 0.18 mu m CMOS process. The fabricated sensor is measured to provide NETD (Noise Equivalent Temperature Difference) value of 163 mK at 17 fps (frames per second) and 71 mK at 4 fps with F/1.0 optics in a dewar environment. The measurement results of the wafer level vacuum packaged sensors with one side AR coating shows an NETD values of 112 mK at 4 fps with F/1.1 optics, i.e., demonstrates a good performance for high volume low-cost applications like advanced presence detection and human counting applications. The CIR approach of MikroSens is scalable and can be used to reduce the pixel pitch even further while increasing the array size if necessary for various other low-cost, high volume applications.
Subject Keywords
Microbolometer
,
Low-cost thermal imaging
,
Uncooled thermal imaging
,
CMOS Infrared (CIR) Technology
,
MEMS
,
LWIR
,
Thermal cameras
,
Readout integrated circuit (ROIC)
URI
https://hdl.handle.net/11511/32716
DOI
https://doi.org/10.1117/12.2275161
Collections
Department of Electrical and Electronics Engineering, Conference / Seminar
Suggestions
OpenMETU
Core
A 160×120 LWIR-band CMOS infrared (CIR) microbolometer
Tankut, Firat; Cologlu, Mustafa H.; Ozturk, Hande; Cilbir, Gorkem; Akar, Orhan S.; Akın, Tayfun (2019-01-01)
This paper introduces a 160x120 CMOS-based microbolometer array with a 35 mu m pixel pitch operating in the 8-12 mu m wavelength range, where the detector is fabricated with the LWIR-band CMOS infrared technology, shortly named as CIR, which is a patented novel approach that allows implementing microbolometers with standard CMOS and simple post-CMOS MEMS processes. Post-CMOS processes require only one mask lithography process and simple subtractive etching steps to obtain suspended microbolometer pixels, as...
An Advanced Presence Detection System Using the CMOS Infrared (CIR) Technology
Arslan, Tugay; Cilbir, Gorkem; Tepegoz, Murat; Akın, Tayfun (2017-04-13)
This paper presents the development of advanced presence detection system using the CMOS infrared (CIR) technology. The recent advancements on microbolometer type uncooled LWIR imaging sensor technology allowed to reduce the fabrication cost of the microbolometer type detectors and the overall wafer cost and therefore to increase the use of this technology in a number of emerging applications, including various consumer applications and advance presence detection systems for smart buildings and smart office...
A Miniature Low-Cost LWIR Camera with a 160x120 Microbolometer FPA
Tepegoz, Murat; Kucukkomurler, Alper; Tankut, Firat; Eminoglu, Selim; Akın, Tayfun (2014-05-08)
This paper presents the development of a miniature LWIR thermal camera, MSE070D, which targets value performance infrared imaging applications, where a 160x120 CMOS-based microbolometer FPA is utilized. MSE070D features a universal USB interface that can communicate with computers and some particular mobile devices in the market. In addition, it offers high flexibility and mobility with the help of its USB powered nature, eliminating the need for any external power source, thanks to its low-power requiremen...
Low-Cost LWIR-Band CMOS Infrared (CIR) Microbolometers for High Volume Applications
Akın, Tayfun (2020-01-01)
This paper provides an overview of the studies and the current status for the development of a novel, low-cost, and CMOS foundry compatible approach for implementing microbolometers with standard CMOS and simple post-CMOS subtractive MEMS processes. This CMOS infrared detector technology is shortly called as the CMOS IR (CIR) technology, and it can be used to implement Focal Plane Arrays (FPAs) for infrared imaging in the LWIR-band (8-12 mu m wavelength). Post-CMOS processes require only one mask lithograph...
A low-cost 128x128 uncooled infrared detector array in CMOS process
Eminoglu, Selim; Tanrikulu, Mahmud Yusuf; Akın, Tayfun (2008-02-01)
This paper discusses the implementation of a low-cost 128 x 128 uncooled infrared microbolometer detector array together with its integrated readout circuit (ROC) using a standard 0.35 mu m n-well CMOS and post-CMOS MEMS processes. The detector array can be created with simple bulk-micromachining processes after the CMOS fabrication, without the need for any complicated lithography or deposition steps. The array detectors are based on suspended p(+)-active/n-well diode microbolometers with a pixel size of 4...
Citation Formats
IEEE
ACM
APA
CHICAGO
MLA
BibTeX
F. Tankut et al., “An 80x80 Microbolometer Type Thermal Imaging Sensor using the LWIR-Band CMOS Infrared (CIR) Technology,” 2017, vol. 10177, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/32716.