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Growth and characterization of Tl3InSe4 single crystals
Date
2011-06-01
Author
QASRAWI, ATEF FAYEZ HASAN
Hasanlı, Nızamı
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Tl3InSe4 single crystal has been successfully prepared by the Bridgman crystal growth technique. The crystal that is reported for the first time is found to be of tetragonal structure with lattice parameters of a=0.8035 and c=0.6883 nm. The electrical resistivity and Hall effect measurements on the crystal revealed a conductivity type conversion from p- to n-type at a critical temperature of 283 K. The electron to hole mobility ratio is found to be 1.10. The analysis of the temperature-dependent electrical resistivity, Hall coefficient and carrier concentration data reveals the extrinsic type of conduction with donor impurity levels that behave as acceptor levels when are empty. The data analysis allowed the calculation of the hole and the electron effective masses as 0.654m(0) and 0.119m(0), respectively. In addition, the temperature-dependent Hall mobility in the n-region is found to be limited by the electron-phonon short-range interactions scattering with an electron-phonon coupling constant of 0.21.
Subject Keywords
Mechanical Engineering
,
General Materials Science
,
Mechanics of Materials
,
Condensed Matter Physics
URI
https://hdl.handle.net/11511/40161
Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
DOI
https://doi.org/10.1016/j.mssp.2011.02.009
Collections
Department of Physics, Article
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TlInSe2 single crystal has been successfully prepared by the Bridgman crystal growth technique. The crystal, which exhibits compositional atomic percentages of 25.4%, 25.2% and 49.4% for TI, In and Se, respectively, is found to be of tetragonal structure with lattice parameters of a=0.8035 and c=0.6883 nm. The crystals were used to design radio frequency sensitive varactor device. The temperature dependence of the current-voltage characteristics of the device allowed the calculation of the room temperature ...
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A. F. H. QASRAWI and N. Hasanlı, “Growth and characterization of Tl3InSe4 single crystals,”
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
, pp. 175–178, 2011, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/40161.