Development of atomic force microscopy system and kelvin probe microscopy system for use in semiconductor nanocrystal characterization

Download

index.pdf

Date

2007

Author

Bostancı, Umut

Metadata

Show full item record

Item Usage Stats

254
views

107
downloads

Atomic Force Microscopy (AFM) and Kelvin Probe Microscopy (KPM) are two surface characterization methods suitable for semiconductor nanocrystal applications. In this thesis work, an AFM system with KPM capability was developed and implemented. It was observed that, the effect of electrostatic interaction of the probe cantilever with the sample can be significantly reduced by using higher order resonant modes for Kelvin force detection. Germanium nanocrystals were grown on silicon substrate using different growth conditions. Both characterization methods were applied to the nanocrystal samples. Variation of nanocrystal sizes with varying annealing temperature were observed. Kelvin spectroscopy measurements made on nanocrystal samples using the KPM apparatus displayed charging effects.

Subject Keywords

Physics.

URI

http://etd.lib.metu.edu.tr/upload/12608812/index.pdf
https://hdl.handle.net/11511/17111

Collections

Graduate School of Natural and Applied Sciences, Thesis

Suggestions

OpenMETU
Core

Mems gyroscopes for tactical-grade inertial measurement applications Alper, Said Emre; Akın, Tayfun; Department of Electrical and Electronics Engineering (2005) This thesis reports the development of high-performance symmetric and decoupled micromachined gyroscopes for tactical-grade inertial measurement applications. The symmetric structure allows easy matching of the resonance frequencies of the drive and sense modes of the gyroscopes for achieving high angular rate sensitivity; while the decoupled drive and sense modes minimizes mechanical cross-coupling for low-noise and stable operation. Three different and new symmetric and decoupled gyroscope structures with...
Deep-trench RIE optimization for high performance MEMS microsensors Aydemir, Akın; Turan, Raşit; Department of Physics (2007) This thesis presents the optimization of deep reactive ion etching process (DRIE) to achieve high precision 3-dimensional integrated micro electro mechanical systems (MEMS) sensors with high aspect ratio structures. Two optimization processes have been performed to achieve 20 μm depth for 1 μm opening for a dissolved wafer process (DWP) and to achieve 100 μm depth for 1 μm opening for silicon-on-glass (SOG) process. A number of parameters affecting the etch rate and profile angle are investigated, including...
Dynamic ion behavior in plasma source ion implantation Bozkurt, Bilge; Bilikmen, Kadri Sinan; Department of Physics (2006) The aim of this work is to analytically treat the dynamic ion behavior during the evolution of the ion matrix sheath, considering the industrial application plasma source ion implantation for both planar and cylindrical targets, and then to de-velop a code that simulates this dynamic ion behavior numerically. If the sepa-ration between the electrodes in a discharge tube is small, upon the application of a large potential between the electrodes, an ion matrix sheath is formed, which fills the whole inter-ele...
Design and production of antireflection coating for Ge, ZnSe and ZnS in 8-12 micrometer wavelength region Üçer, Begüm; Parlak, Mehmet; Department of Physics (2009) This thesis describes the works done during the design and deposition process of the antireflection coating for the materials commonly used as refractive optical elements in thermal imaging systems. These coatings are quite necessary to reduce reflection losses from the surface of the optics and stray light that directly affects the image quality. Germanium, zinc sulfide and zinc selenide were used as substrate material and their optical properties were investigated with infrared ellipsometry and FTIR. Anti...
Calculation of phase diagrams and the thermodynamic quantities from the mean field models close to phase transitions in molecular and liquid crystals Şen, Sema; Yurtseven, Hasan Hamit; Department of Physics (2009) This study gives our calculations for the temperature-pressure and temperature-concentration phase diagrams using the mean field models applied to ammonium halides (NH4Cl, ND4Cl), ammonium sulfate ((NH4)2SO4/H2O), lithium potassium rubidium sulfate (LiK1-xRbxSO4), potassium pyrosulfate-potassium hydrogensulfate (K2S2O7-KHSO4), cholestanyl myristate-cholesteryl myristate (CnM-CrM), cholestanyl myristate-cholesteryl oleate (CnM-CO), benzene (C6H6) and ice. The phase line equations are derived from the free en...

Citation Formats

U. Bostancı, “Development of atomic force microscopy system and kelvin probe microscopy system for use in semiconductor nanocrystal characterization,” M.S. - Master of Science, Middle East Technical University, 2007.