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Energy transfer and stimulated emission dynamics at 1.1 mu m in Nd-doped SiNx
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Date
2011-03-14
Author
Li, Rui
Yerci, Selçuk
Kucheyev, Sergei O.
van Buuren, Tony
Dal Negro, Luca
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Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License
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Neodymium (Nd) doped amorphous silicon nitride films with various Si concentrations (Nd:SiNx) were fabricated by reactive magnetron co-sputtering followed by thermal annealing. The time dynamics of the energy transfer in Nd:SiNx was investigated, a systematic optimization of its 1.1 mu m emission was performed, and the Nd excitation cross section in SiNx was measured. An active Nd:SiNx micro-disk resonator was fabricated and enhanced radiation rate at 1.1 mu m was demonstrated due to stimulated emission at the whispering gallery resonant modes. These results provide an alternative approach for the engineering of Si-based optical amplifiers and lasers on a silicon nitride materials platform. (C) 2011 Optical Society of America
Subject Keywords
Resonators
,
Integrated optics devices
,
Rareearth-doped materials
,
Microcavity devices
,
Rare earth and transition metal solid-state lasers
URI
https://hdl.handle.net/11511/31212
Journal
OPTICS EXPRESS
DOI
https://doi.org/10.1364/oe.19.005379
Collections
Graduate School of Natural and Applied Sciences, Article
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R. Li, S. Yerci, S. O. Kucheyev, T. van Buuren, and L. Dal Negro, “Energy transfer and stimulated emission dynamics at 1.1 mu m in Nd-doped SiNx,”
OPTICS EXPRESS
, pp. 5379–5385, 2011, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/31212.