BHCl2 formation during chemical vapor deposition of boron in a dual-impinging jet reactor

Date

1997-12-01

Author

Sezgi, Naime Aslı
Ozbelge, HO

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Chemical vapor deposition (CVD) of boron from BCl3 and Hz was investigated in a dual-impinging jet reactor which was connected to an FT-IR spectrometer for on-line chemical analysis of the reactor outlet stream. Formation of the intermediate, BHCl2, during CVD of boron on a hot tungsten substrate was experimentally verified, Boron deposition started at substrate temperatures of around 750 degrees C and showed a significant deposition rate increase with an increase in temperature. At a surface temperature of 1350 degrees C, fractional conversion of BCl3 to B and BHCl2 was found to be around 0.6 and 0.2, respectively. At temperatures less than 1100 degrees C, fractional conversion of BCl3 to BHCl2 was found to be higher than the fractional conversion to boron. Formation of BHCl2 occurs in the gas phase even at temperatures lower than 750 degrees C. Contribution of surface reactions to the formation of BHCl2 increases with an increase in temperature.

Subject Keywords

Hydrogen, Deposition, Boron, Chemical vapor deposition, Surface reactions

URI

https://hdl.handle.net/11511/38607

Journal

INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

DOI

https://doi.org/10.1021/ie970225r

Collections

Department of Chemical Engineering, Article

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Kinetic studies for boron carbide formation in a dual impinging-jet reactor Noyan-Dilek, S; Ozbelge, HO; Sezgi, Naime Aslı; Dogu, T (2001-02-07) The chemical vapor deposition (CVD) of boron carbide was investigated on a tungsten substrate from a gas mixture of BCl3, H-2, and CH4 in a dual impinging-jet reactor that was connected to an FT-IR spectrometer for on-line analysis of the reactor effluent stream. During CVD of boron carbide, the formation of BHCl2 was experimentally verified, and beta -rhombohedral B4C was formed. Conversion to boron carbide was found to increase with an increase in the BCl3/CH4 ratio. However, conversion to dichloroborane ...
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Citation Formats

N. A. Sezgi and H. Ozbelge, “BHCl2 formation during chemical vapor deposition of boron in a dual-impinging jet reactor,” INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, pp. 5537–5540, 1997, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/38607.