Decomposition of SiH4 on the S-A type stepped Si(100) surface

Date

2002-06-01

Author

Katırcıoğlu, Şenay

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The density functional theory method is used to explore the mechanism of dissociative adsorption of silane (SiH4) on the S-A type stepped Si(100) surface. Two reaction paths are described that produce silyl (Sills) and hydrogen atom fragments adsorbed on the dimer bonds present on each terrace. It has been found that the initial stage of the dissociation of SiH4 on the SA type stepped Si(100) surface shows similarity to the dissociation of SiH4 on the flat Si(100) surface; SiH3 and hydrogen fragments bond to the Si dimer atoms by following the first reaction path.

Subject Keywords

SiH4, Silane, Decomposition, Stepped Si(100) surface, Density functional theory, B3LYP

URI

https://hdl.handle.net/11511/40304

Journal

SURFACE REVIEW AND LETTERS

DOI

https://doi.org/10.1142/s0218625x02003901

Collections

Department of Physics, Article

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Citation Formats

Ş. Katırcıoğlu, “Decomposition of SiH4 on the S-A type stepped Si(100) surface,” SURFACE REVIEW AND LETTERS, pp. 1401–1407, 2002, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/40304.