Thin films of hard cubic Zr3N4 stabilized by stress

Date

2005-04-01

Author

Chhowalla, M
Ünalan, Hüsnü Emrah

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Hard, refractory thin films consisting of group IVB element mono-nitrides deposited using various chemical and physical vapour-deposition techniques are widely used in wear-resistant applications. As the demand for performance exceeds the capabilities of existing materials, new materials with superior properties must be developed. Here we report the realization and characterization of hard cubic Zr3N4 (c-Zr3N4) thin films. The films, deposited using a novel but industrially viable modified filtered cathodic arc (FCA) method, undergo a phase transformation from orthorhombic to cubic above a critical stress level of 9 GPa as determined by X-ray diffraction and Raman spectroscopy. The c-Zr3N4 films are significantly harder (similar to 36 GPa) than both the orthorhombic Zr3N4 (o-Zr3N4) and ZrN films (similar to 27 GPa). The ability to deposit this material directly onto components as a thin film will allow its use in wear- and oxidation-resistant applications.

Subject Keywords

Mechanical Engineering, General Materials Science, Mechanics of Materials, General Chemistry, Condensed Matter Physics

URI

https://hdl.handle.net/11511/41575

Journal

NATURE MATERIALS

DOI

https://doi.org/10.1038/nmat1338

Collections

Department of Metallurgical and Materials Engineering, Article

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Citation Formats

M. Chhowalla and H. E. Ünalan, “Thin films of hard cubic Zr3N4 stabilized by stress,” NATURE MATERIALS, pp. 317–322, 2005, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/41575.