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Effect of aluminum thickness and etching time of aluminum induced texturing process on soda lime glass substrates for thin solar cell applications

2015-04-29
Ünal, Mustafa
Nasser, Hisham
Gunoven, Mete
Sokmen, Ilkay
Tankut, Aydin
Turan, Raşit
In this study, aluminum induced texturing (AIT) technique is used to increase light absorption in thin film by way of increasing the portion of the diffuse transmitted light (haze). For this purpose, various AIT process parameters such as starting aluminum thicknesses, annealing temperature and time, etching time, etchant's concentrations, and temperature of etching are known to affect the final texture. We have investigated the effect of aluminum thickness and etching time on AIT process while keeping the other parameters fixed. Our results show that by changing initial aluminum thickness and etching time, it is possible to control surface morphology of glass substrate and the resulting optical diffuse transmittance. In addition, diffuse transmittance is increased over the visible range of solar spectra and total absorption by a‐Si:H is increased.