Effects of Solvents on Dissolution of Photoresist in Parylene Microchannels

Date

2012-06-21

Author

Koydemir, Hatice Ceylan
Külah, Haluk
Özgen, Canan
Tosun, İsmail

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This paper presents a study for the effects of different types of solvents on dissolution of photo resist inside the parylene micro channels. Theoretical and experimental studies were carried out to model the dynamic behavior of the dissolution. In this account, dissolution rate expressions were derived by taking into account the reaction of resist with the solvent. Micro channels with a cross section of 15 mu m x 50 mu m were fabricated by encapsulating photo resist inside the parylene layers and using glass wafer as substrate. Experimental results indicated that photo resist dissolution in dipolar aprotic solvents was much faster than the other types of solvents. This finding can be used to select alternative chemicals for stripping encapsulated photo resist.

Subject Keywords

Microfluidics, Micro channel, Parylene C, Dissolution of photo resist

URI

https://hdl.handle.net/11511/54348

Collections

Department of Electrical and Electronics Engineering, Conference / Seminar