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Effects of Solvents on Dissolution of Photoresist in Parylene Microchannels
Date
2012-06-21
Author
Koydemir, Hatice Ceylan
Külah, Haluk
Özgen, Canan
Tosun, İsmail
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Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License
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This paper presents a study for the effects of different types of solvents on dissolution of photo resist inside the parylene micro channels. Theoretical and experimental studies were carried out to model the dynamic behavior of the dissolution. In this account, dissolution rate expressions were derived by taking into account the reaction of resist with the solvent. Micro channels with a cross section of 15 mu m x 50 mu m were fabricated by encapsulating photo resist inside the parylene layers and using glass wafer as substrate. Experimental results indicated that photo resist dissolution in dipolar aprotic solvents was much faster than the other types of solvents. This finding can be used to select alternative chemicals for stripping encapsulated photo resist.
Subject Keywords
Microfluidics
,
Micro channel
,
Parylene C
,
Dissolution of photo resist
URI
https://hdl.handle.net/11511/54348
Collections
Department of Electrical and Electronics Engineering, Conference / Seminar
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H. C. Koydemir, H. Külah, C. Özgen, and İ. Tosun, “Effects of Solvents on Dissolution of Photoresist in Parylene Microchannels,” 2012, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/54348.
