Ion implantation in planar targets with semi-cylindrical grooves.

Filiz, Yasemin


Ion implantation in plasmas with diminishing positive column.
Akman, Sema; Demokan, Ordal; Department of Physics (2002)
Ion implantation and deposition on the inner surfaces of cylinders by exploding metallic foils
Demokan, O (2000-10-01)
A novel scheme for ion deposition and possibly ion implantation on the inner surfaces of cylindrical targets is proposed and experimentally tested. A large current is passed through a coaxial table-type structure, composed of a straight conductor and a thin metallic foil, surrounding it. The foil evaporates and ionizes forming a metallic plasma, which is pushed radially outward due to the pressure of the magnetic field, confined to the region between the plasma and the conductor. The ions of the foil materi...
Ion implantation in confined, pinching metallic plasmas
Demokan, O; Marji, E (1999-02-15)
A series of preliminary experiments have been carried out to obtain a metallic arc discharge, in the form of an annular cylindrical column, carrying a current in the axial direction. To assert this geometry, a ring-shaped cathode is adopted and an arc formation is triggered by heating the cathode externally. The plasma, initially in the form of a cylindrical shell, is seen to be confined and pinched by its own magnetic field. The resulting, radially inward flux is observed to produce efficient and multidire...
Ion-matrix sheaths related to targets with grooves
Demokan, O (2002-05-01)
In this work, the ion-matrix sheath near a target with a rectangular groove is studied analytically. A two-dimensional model with a single groove is adopted. The potential and electric-field profiles within the groove are analyzed to provide insight regarding the uniformity and efficiency of ion implantation on its walls. The deviation of the sheath edge from the planar geometry is also illustrated. (C) 2002 American Institute of Physics.
Ion Implanted Homojunction Crystalline Silicon Solar Cells
Bektaş, Gence; Turan, Raşit; Ünalan, Hüsnü Emrah; Department of Micro and Nanotechnology (2022-6-22)
Process simplification is one of the requirements to reduce the workload and cost of solar cell manufacturing, especially for complex designs. In particular, the application of the ion implantation method in patterned and single side doping processes, which are the bottlenecks of the diffusion method, brings many conveniences in cell production. Flexibility in the selection of masking material during doping is another important factor that makes the ion implantation method attractive. Moreover, by varying t...
Citation Formats
Y. Filiz, “Ion implantation in planar targets with semi-cylindrical grooves.,” Middle East Technical University, 2002.