A ROOM TEMPERATURE, ZERO FORCE, WAFER-LEVEL ATTACHMENT METHOD FOR MEMS INTEGRATION

2013-01-24
Beker, Levent
Zorlu, Ozge
Külah, Haluk
This paper presents a wafer level attachment method for handling various shaped structures for MEMS processes, using parylene as an interlayer material. In this method, a handle wafer containing pillars and perforations is utilized, and structures are attached to the handle wafer through a parylene coating process realized at room temperature with no applied force. It is observed that pillars with 20 mu m height, 2.5 mm side length, and 4.5 mm spacing can successfully be used to attach two 4 '' substrates to each other. The shear strength between the attached substrates is measured as 0.49 MPa, proving the feasibility of the method for integrating various materials into MEMS processes.

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Citation Formats
L. Beker, O. Zorlu, and H. Külah, “A ROOM TEMPERATURE, ZERO FORCE, WAFER-LEVEL ATTACHMENT METHOD FOR MEMS INTEGRATION,” 2013, Accessed: 00, 2020. [Online]. Available: https://hdl.handle.net/11511/55368.